Optical element and method of calibrating a measuring apparatus comprising a wave shaping structure
US8089634B2 · kind B2 · utility
1Cited by
19References
20Claims
0Family size
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Key dates
| Filing date | Jan 8, 2010 |
| Grant date | Jan 3, 2012 |
| Priority date | — |
| Expiry date | Jan 8, 2030 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49771
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Optical element having an optical surface, which optical surface is adapted to a non-spherical target shape, such that a long wave variation of the actual shape of the optical surface with respect to the target shape is limited to a maximum value of 0.2 nm, wherein the long wave variation includes only oscillations having a spatial wavelength equal to or larger than a minimum spatial wavelength of 10 mm.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.