Patent · US Active

Method for increasing the accuracy of the positioning of a first object relative to a second object

US8094925B2 · kind B2 · utility

5Cited by

9References

5Claims

0Family size

Assignee

Cascade Microtech, Inc. · US

Inventors

Stefan Schneidewind · Sankt Goar, DE
Claus Dietrich · Sacka, DE
Jorg Kiesewetter · Thiendorf, DE
Michael Teich · Mannheim, DE
Thomas Tharigen · Dresden, DE

Key dates

Filing date	Nov 16, 2009
Grant date	Jan 10, 2012
Priority date	—
Expiry date	Nov 16, 2029

Classification

Technology area (CPC G)Physics
CPC primaryG06T2207/30148
WIPO fieldComputer technology
WIPO sectorElectrical engineering

Abstract

A method is provided for increasing the accuracy of the positioning of a first object relative to a second object. The method overcomes the disadvantageous influence of thermal drift between a first and a second object during a positioning of a first object on a second object. The method finds applications in manufacturing, for example, in the manufacturing of semiconductor components. The method utilizes recognition of structures on the second object which have a minimum structure width. At a first instant, using one recognition procedure, the first object is positioned on the second object in a desired position. The relative displacement of the two objects is determined at the first instant and on at least one subsequent instant. A second recognition procedure may be used for this purpose. The second recognition procedure may have a resolution accuracy which is different than the resolution accuracy of the first resolution procedure. The second recognition procedure may be a pattern recognition method. The relative displacement determined at the second instant is used to correct the positioning of the first and second objects as necessary to maintain a desired position of the two…

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.