Method of cleaning and after treatment of optical surfaces in an irradiation unit

US8097092B2 · kind B2 · utility

Assignee

• Kninklijke Philips Electronics N.V. · NL

Inventors

• Guenther Hans Derra · Aachen, DE
• Thomas Kruecken · Aachen, DE
• Christof Metzmacher · Verviers, BE
• Achim Weber · Altbach, DE
• Peter Zink · Aachen, DE

Key dates

• Filing date: Jun 20, 2006
• Grant date: Jan 17, 2012
• Expiry date: May 7, 2028

Classification

• Technology area (CPC B): Performing Operations; Transporting
• CPC primary: B08B7/0035
• WIPO field: Chemical engineering
• WIPO sector: Chemistry

Abstract

The present invention relates to a method of cleaning and after treatment of optical surfaces in an irradiation unit, said irradiation unit comprising a radiation source (1, 31) emitting EUV-radiation and/or soft X-rays, a first volume (40) following said radiation source (1, 31) and containing first optical components (3, 33) with said optical surfaces, and a second volume (41) following said first volume (40) and containing second optical components (38). The method comprises at least one cleaning step in which a first gas or gas mixture is brought into contact with said optical surfaces, thereby forming volatile compounds with contaminations deposited on said optical surfaces, wherein said compounds are pumped out of the first volume (40) together with the first gas or gas mixture. In an after treatment step following said cleaning step the radiation source (1, 3) is operated once or several times in order to release residues of the cleaning step from the optical surfaces by irradiating said optical surfaces with said EUV-radiation or soft X-rays while the first volume (40) is separated from the second volume (41), wherein said released residues are pumped out of the first volum…