Patent · US Active

Optical inspection system and method

US8102521B2 · kind B2 · utility

4Cited by

22References

14Claims

0Family size

Assignee

Nanda Technologies GmbH · DE

Inventors

Lars Markwort · Haimhausen, DE
Rajeshwar Chhibber · San Jose, US
Klaus Eckerl · Hutthurm, DE
Norbert Harendt · Hutthurm, DE

Key dates

Filing date	Oct 29, 2010
Grant date	Jan 24, 2012
Priority date	—
Expiry date	Oct 29, 2030

Classification

Technology area (CPC H)Electricity
CPC primaryH01L22/12
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

An inspection system includes optics, an object support for mounting an object in a region of an object plane of the optics, a bright-field light source, and a dark-field light source. The inspection system also includes an image detector having a radiation sensitive substrate disposed in a region of an image plane of the optics and a beam dump.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.