Apparatus and method for measuring structures on a mask and or for calculating structures in a photoresist resulting from the structures
US8102541B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jan 15, 2008 |
| Grant date | Jan 24, 2012 |
| Priority date | — |
| Expiry date | Sep 30, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/84
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An apparatus (1) for measuring structures (3) on a mask (2) and for calculating structures in a photoresist on a wafer resulting from the structures (3) on the mask (2) is disclosed, wherein the apparatus (1) comprises at least one incident-light illumination means (14) and/or one transmitted-light illumination means (6), wherein the apparatus (1) comprises at least one imaging optics (9) and a detector (11) of a camera (10) for imaging the structures (3) on the mask (2), wherein a first computer program (17) is associated with the detector (11) of the camera (10) and provided for determining the position and/or the dimension of the structure (3) on the mask (2). A method for measuring structures (3) on a mask (2) and for calculating structures in a photoresist on a wafer to be expected from the structures (3) on the mask (2) is also disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.