Method for OPC correction
US8103995B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jan 20, 2009 |
| Grant date | Jan 24, 2012 |
| Priority date | — |
| Expiry date | Oct 20, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/36
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An optical proximity correction method is disclosed, comprising establishing an optical proximity correction (OPC) model, and performing an OPC correction step to correct segments of a layout pattern. The OPC correction comprises the step of defining an edge of the layout pattern neighboring a hot-spot location on a mask to locate a target point and a dissection point. The step of locating the target point and the dissection point includes setting a plurality of pre-target points and pre-dissection points, and electing a target point and a dissection point for correcting the segments of the layout pattern from the pre-target points and pre-dissection points according to image quality of the pre-target points and pre-dissection points.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.