Li-Ming Wang
26Patents
10h-index
29Co-inventors
75Inventor score
Filing activity: Dec 9, 1993 → Jul 18, 2019
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| USD718752S1 | Router | General | 33 | Active |
| US5985363A | Method of providing uniform photoresist coatings for tight control of image dimensions | Electricity | 31 | Expired |
| US5785869A | Method for creating a leukocyte rich sample from a mixed population of blood cells | Emerging Cross-Sectional Technologies | 29 | Expired |
| USD718288S1 | Router | General | 25 | Active |
| US5677001A | Striation-free coating method for high viscosity resist coating | Performing Operations; Transporting | 19 | Expired |
| US6509137B1 | Multilayer photoresist process in photolithography | Electricity | 16 | Expired |
| US5811061A | Method and device for testing blood units for viral contamination | Emerging Cross-Sectional Technologies | 15 | Expired |
| US5780105A | Method for uniformly coating a semiconductor wafer with photoresist | Physics | 15 | Expired |
| US6915922B2 | Pressure tank | Performing Operations; Transporting | 12 | Expired |
| US5686238A | Method and device for testing blood units for viral contamination | Performing Operations; Transporting | 12 | Expired |
| US6352896B1 | Method of manufacturing DRAM capacitor | Electricity | 9 | Expired |
| US8033416B2 | Pressure tank having plural access openings | Mechanical Engineering; Lighting; Heating | 8 | Active |
| US6544695B2 | Photomask set for photolithographic operation | Physics | 4 | Expired |
| US6497982B1 | Method for suppressing optical proximity effect bias within a wafer | Emerging Cross-Sectional Technologies | 4 | Expired |
| US6944627B2 | Content management system and methodology employing a tree-based table hierarchy featuring arbitrary information retrieval from different locations in the hierarchy | Emerging Cross-Sectional Technologies | 4 | Expired |
| US6465160B1 | Method for preventing side-lobes in photolithography | Physics | 3 | Expired |
| US8651315B2 | Pressure tank | Mechanical Engineering; Lighting; Heating | 2 | Active |
| US7392503B2 | Method of correcting mask pattern | Electricity | 2 | Expired |
| US8348085B2 | Pressure tank | Mechanical Engineering; Lighting; Heating | 2 | Active |
| US8103995B2 | Method for OPC correction | Physics | 2 | Active |
| US7550237B2 | Systems and methods for determining width/space limits for mask layout | Physics | 1 | Active |
| US7049425B2 | Methods and compositions utilizing an alternative splice variant of the sigma-1 receptor | Chemistry; Metallurgy | 1 | Expired |
| US9255663B2 | Pressure tank | Mechanical Engineering; Lighting; Heating | 1 | Active |
| US7970485B2 | Systems and methods for determining width/space limits for a mask layout | Physics | 1 | Active |
| US12359771B2 | Pressure tank | Mechanical Engineering; Lighting; Heating | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.