Resist composition containing novel sulfonium compound, pattern-forming method using the resist composition, and novel sulfonium compound
US8110333B2 · kind B2 · utility
5Cited by
2References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 1, 2008 |
| Grant date | Feb 7, 2012 |
| Priority date | — |
| Expiry date | Apr 17, 2030 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/106
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A resist composition includes (A) a compound represented by the following formula (I):wherein each of R1 to R13 independently represents a hydrogen atom or a substituent, provided that at least one of R1 to R13 is a substituent containing an alcoholic hydroxyl group; Z represents a single bond or a divalent linking group; and X− represents an anion containing a proton acceptor functional group.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.