Write-pattern determination for maskless lithography
US8111380B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 8, 2008 |
| Grant date | Feb 7, 2012 |
| Priority date | — |
| Expiry date | Sep 3, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70508
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for generating a write pattern to be used in a maskless-lithography process is described. During the method, a computer system determines a one-to-one correspondence between pixels in the write pattern and at least a subset of elements in a spatial-light modulator used in the maskless-lithography process. Furthermore, the computer system generates the write pattern. Note that the write pattern includes features corresponding to at least the subset of elements in the spatial-light modulator, and the generating is in accordance with a characteristic dimension of an element in the spatial-light modulator and a target pattern that is to be printed on a semiconductor wafer during the maskless-lithography process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.