Patent · US Active

Method and apparatus for residue detection in the edge deleted area of a substrate

US8111390B2 · kind B2 · utility

1Cited by

4References

20Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Kenneth Tsai · Huangguan, CN
Asaf Schlezinger · Sunnyvale, US

Key dates

Filing date	Apr 17, 2009
Grant date	Feb 7, 2012
Priority date	—
Expiry date	Mar 25, 2030

Classification

Technology area (CPC G)Physics
CPC primaryG01N21/958
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

Apparatus and methods for detecting residue on a glass substrate and method of use are disclosed. The apparatus comprises a substrate support, a sensor, a controller and a peripheral device in communication with the controller. The apparatus measures the height or thickness of a main surface and an edge delete surface of a substrate to determine if film residue is present on the edge delete surface.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.