Graphoepitaxial self-assembly of arrays of downward facing half-cylinders
US8114301B2 · kind B2 · utility
34Cited by
61References
34Claims
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Key dates
| Filing date | May 2, 2008 |
| Grant date | Feb 14, 2012 |
| Priority date | — |
| Expiry date | Feb 24, 2029 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/249921
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
Methods for fabricating sublithographic, nanoscale microstructures in line arrays utilizing self-assembling block copolymers, and films and devices formed from these methods are provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.