Amorphous oxide release layers for imprint lithography, and method of use
US8114331B2 · kind B2 · utility
5Cited by
5References
23Claims
0Family size
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Key dates
| Filing date | Jan 2, 2008 |
| Grant date | Feb 14, 2012 |
| Priority date | — |
| Expiry date | Jun 20, 2029 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S977/887
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
Amorphous inorganic oxides are used as release layers on templates for nanoimprint lithography. Such a layer facilitates the release of a template from a cured, hardened composition into which the template has transferred a pattern, by reducing the adhesion energy between the release layer and the cured, hardened composition. The release layer may include one or more metallic or semiconductor elements such as Al, Cu, Co, Sb, Ti, Ta, W and Ge.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.