Photoacid generator, resist composition, and patterning process
US8114571B2 · kind B2 · utility
24Cited by
24References
17Claims
0Family size
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Key dates
| Filing date | Apr 30, 2009 |
| Grant date | Feb 14, 2012 |
| Priority date | — |
| Expiry date | Jul 23, 2030 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/115
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Photoacid generators generate sulfonic acids of formula (1a) or (1b) upon exposure to high-energy radiation.R1—COOCH2CF2SO3−H+ (1a)R1—O—COOCH2CF2SO3−H+ (1b)R1 is a monovalent C20-C50 hydrocarbon group of steroid structure which may contain a heteroatom. The bulky steroid structure ensures adequate control of acid diffusion. The photoacid generators are compatible with resins and suited for use in chemically amplified resist compositions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.