Takeru Watanabe
189Patents
19h-index
81Co-inventors
89Inventor score
Filing activity: May 10, 1999 → Feb 28, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6312867A | Ester compounds, polymers, resist compositions and patterning process | Emerging Cross-Sectional Technologies | 133 | Expired |
| US6448420B1 | Acid-decomposable ester compound suitable for use in resist material | Physics | 109 | Expired |
| US7569326B2 | Sulfonium salt having polymerizable anion, polymer, resist composition, and patterning process | Emerging Cross-Sectional Technologies | 79 | Active |
| US7084303B2 | Tertiary amine compounds having an ester structure and processes for preparing same | Physics | 72 | Expired |
| US6147249A | Ester compounds, polymers, resist composition and patterning process | Emerging Cross-Sectional Technologies | 62 | Expired |
| US6749988B2 | Amine compounds, resist compositions and patterning process | Physics | 35 | Expired |
| US6673511B1 | Resist composition | Emerging Cross-Sectional Technologies | 34 | Expired |
| US7511169B2 | Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | Emerging Cross-Sectional Technologies | 34 | Active |
| US6284429A | Ester compounds, polymers, resist compositions and patterning process | Emerging Cross-Sectional Technologies | 33 | Expired |
| US6517994B2 | Lactone ring-containing (meth)acrylate and polymer thereof for photoresist composition | Physics | 31 | Expired |
| US7527912B2 | Photoacid generators, resist compositions, and patterning process | Emerging Cross-Sectional Technologies | 31 | Active |
| US6916593B2 | Resist composition | Emerging Cross-Sectional Technologies | 30 | Expired |
| US7759047B2 | Resist protective film composition and patterning process | Physics | 29 | Active |
| US6746818B2 | (Meth)acrylates having lactone structure, polymers, photoresist compositions and patterning process | Emerging Cross-Sectional Technologies | 24 | Expired |
| US8114571B2 | Photoacid generator, resist composition, and patterning process | Emerging Cross-Sectional Technologies | 24 | Active |
| US7514202B2 | Thermal acid generator, resist undercoat material and patterning process | Emerging Cross-Sectional Technologies | 22 | Active |
| US7622242B2 | Resist composition and patterning process | Emerging Cross-Sectional Technologies | 21 | Active |
| US6492090B2 | Polymers, resist compositions and patterning process | Physics | 21 | Expired |
| US7670751B2 | Photoacid generator, resist composition, and patterning process | Emerging Cross-Sectional Technologies | 20 | Active |
| US6743564B2 | Amine compounds, resist compositions and patterning process | Emerging Cross-Sectional Technologies | 19 | Expired |
| US7981589B2 | Fluorinated monomer, fluorinated polymer, resist composition and patterning process | Emerging Cross-Sectional Technologies | 19 | Active |
| US7919226B2 | Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | Emerging Cross-Sectional Technologies | 19 | Active |
| US8114570B2 | Photoacid generator, resist composition, and patterning process | Emerging Cross-Sectional Technologies | 15 | Active |
| US8323872B2 | Resist protective coating material and patterning process | Physics | 15 | Active |
| US6444396B1 | Ester compounds, polymers, resist composition and patterning process | Emerging Cross-Sectional Technologies | 14 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.