Patent · US Active

Infrared reflecting layer system for transparent substrate

US8119194B2 · kind B2 · utility

3Cited by

3References

14Claims

0Family size

Assignee

VON ARDENNE Anlagentechnik GmbH · DE

Inventors

Christoph Koekert · Radebeul, DE
Holger Proehl · Dresden, DE
Falk Milde · Dresden, DE

Key dates

Filing date	May 17, 2007
Grant date	Feb 21, 2012
Priority date	—
Expiry date	Mar 20, 2030

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10T428/24942
WIPO fieldMaterials, metallurgy
WIPO sectorChemistry

Abstract

An infrared radiation reflecting transparent layer system on a transparent substrate and a method for producing same is provided. The infrared radiation reflecting layer system comprises an infrared radiation reflecting layer sequence which includes a selective function usually consisting of a noble metal, mostly silver, or an alloy thereof and having a good selective reflectivity in the infrared range. The layer sequence is supplemented by at least one transparent dielectric layer of an oxynitride of a metal, a semiconductor or a semiconductor alloy having a low to moderate refractive index arranged directly on the substrate or above the infrared radiation reflecting layer sequence.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.