Photosensitive resin composition, light-shielding color filter and production process therefor, and image sensor
US8119311B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 26, 2009 |
| Grant date | Feb 21, 2012 |
| Priority date | — |
| Expiry date | Feb 19, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/031
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photosensitive resin composition is provided that includes at least (A) titanium black, (B) a polymerizable compound, (C) a photopolymerization initiator (D) a resin, and (E) an organic solvent, the photopolymerization initiator (C) using in combination two or more types of photopolymerization initiators including at least one type of oxime-based photopolymerization initiator. There are also provided a light-shielding color filter having a pattern formed by using the photosensitive resin composition, a process for producing a light-shielding color filter that includes a step of coating a substrate with the photosensitive resin composition, a step of imagewise exposing, and a step of developing to form a pattern, and an image sensor having the light-shielding color filter.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.