Patent · US Active

Lithographic apparatus

US8120752B2 · kind B2 · utility

1Cited by

6References

4Claims

0Family size

Assignee

ASML NETHERLANDS B.V. · NL

Inventors

Wouter Anthon Soer · Nijmegen, NL
Maarten Marinus Johannes Wilhelmus Van Herpen · Heesch, NL

Key dates

Filing date	May 14, 2009
Grant date	Feb 21, 2012
Priority date	—
Expiry date	Aug 25, 2030

Classification

Technology area (CPC G)Physics
CPC primaryG21K2201/067
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A zone plate includes a plurality of consecutively arranged, adjacent, and alternating first and second regions. The first regions are arranged to be substantially transparent to a first predetermined wavelength of radiation and a second predetermined wavelength of radiation that is different from the first predetermined wavelength of radiation. The second regions are arranged to be substantially opaque, diffractive, or reflective to the first predetermined wavelength of radiation and substantially transparent to the second predetermined wavelength of radiation.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.