Optimization and matching of optical systems by use of orientation Zernike polynomials

US8126669B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Michael Totzeck · Schwäbisch Gmünd, DE
• Daniel Kraehmer · Aalen, DE
• Ralf Mueller · Germersheim, DE
• Johannes Ruoff · Aalen, DE
• Vladan Blahnik · Aalen, DE

Key dates

• Filing date: Apr 10, 2009
• Grant date: Feb 28, 2012
• Expiry date: Jul 17, 2030

Classification

• Technology area (CPC G): Physics
• CPC primary: G01M11/0257
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

The present disclosure relates to specification, optimization and matching of optical systems by use of orientation Zernike polynomials. In some embodiments, a method for assessing the suitability of an optical system of a microlithographic projection exposure apparatus is provided. The method can include determining a Jones pupil of the optical system, at least approximately describing the Jones pupil using an expansion into orientation Zernike polynomials, and assessing the suitability of the optical system on the basis of the expansion coefficient of at least one of the orientation Zernike polynomials in the expansion.