Patent · US Active

Plasma supply device

US8129653B2 · kind B2 · utility

84Cited by

45References

29Claims

0Family size

Assignee

HUETTINGER Elektronik GmbH + Co. KG · DE

Inventors

Thomas Kirchmeier · Teningen, DE
Hans-Juergen Windisch · Ehrenkirchen, DE
Hanns-Joachim Knaus · Emmendingen, DE
Michael Glueck · Schreiber, CA
Gerd Hintz · Schallstadt, DE

Key dates

Filing date	Jul 2, 2008
Grant date	Mar 6, 2012
Priority date	—
Expiry date	Oct 18, 2030

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY02B20/00
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

A plasma supply device generates an output power greater than 500 W at an essentially constant basic frequency greater than 3 MHz and powers a plasma process to which is supplied the generated output power, and from which reflected power is returned to the plasma supply device. The plasma supply device includes at least one inverter connected to a DC power supply, which inverter has at least one switching element, and an output network. The output network is arranged on a printed circuit board. The output network can therefore be designed low priced and accurately.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.