Thin film coating system and method
US8133361B2 · kind B2 · utility
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2References
15Claims
0Family size
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Key dates
| Filing date | Oct 27, 2008 |
| Grant date | Mar 13, 2012 |
| Priority date | — |
| Expiry date | Jun 2, 2030 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB05D1/002
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method and system for depositing a thin film on a substrate. In the system a target material is deposited and reacted on a substrate surface to form a substantially non-absorbing thin film. The volume of non-absorbing thin film formed per unit of time may be increased by increasing the area of the surface by a factor of “x” and increasing the rate of deposition of the target material by a factor greater than the inverse of the factor “x” to thereby increase the rate of formation of the volume of non-absorbing thin film per unit of time.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.