Patent · US Active

Method for modifying insulating or semi-conductive surfaces, and resulting products

US8133549B2 · kind B2 · utility

6Cited by
13References
14Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 9, 2006
Grant dateMar 13, 2012
Priority date
Expiry dateSep 22, 2028

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC08J2323/10
  • WIPO fieldOther special machines
  • WIPO sectorMechanical engineering

Abstract

The present invention relates to the use of a R—N2+ diazonium salt carrying an aromatic group R, for grafting of the aromatic group onto insulating, semiconductor, binary or ternary compound or composite material surfaces, the diazonium salt being present at a concentration close to its solubility limit, notably at a concentration higher than 0.05 M, and preferably varying between approximately 0.5 M to approximately 4 M.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.