Patent · US Active

Illumination system of a microlithographic exposure apparatus

US8134687B2 · kind B2 · utility

0Cited by

25References

20Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Wolfgang Singer · Aalen, DE
Johannes Wangler · Oberkochen, DE
Rafael Egger · Munich, DE
Wilhelm Ulrich · Aalen, DE

Key dates

Filing date	Aug 23, 2005
Grant date	Mar 13, 2012
Priority date	—
Expiry date	Mar 4, 2028

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70183
WIPO fieldOptics
WIPO sectorInstruments

Abstract

An illumination system of a microlithographic exposure apparatus has an optical axis and a beam transforming device. This device includes a first mirror with a first reflective surface having a shape that is defined by rotating a straight line, which is inclined with respect to the optical axis, around the optical axis. The device further includes a second mirror with a second reflective surface having a shape that is defined by rotating a curved line around the optical axis. At least one of the mirrors has a central aperture containing the optical axis. This device may form a zoom-collimator for an EUV illumination system that transforms a diverging light bundle into a collimated light bundle of variable shape and/or diameter.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.