Patent · US Active

Coater with a large-area assembly of rotatable magnetrons

US8137510B2 · kind B2 · utility

2Cited by

8References

15Claims

0Family size

Assignee

Applied Materials GmbH & Co. KG · DE

Inventors

Stefan Bangert · Lauentheil, DE
Frank Fuchs · Rutesheim, DE
Ralph Lindenberg · Büdingen, DE
Andreas Lopp · Neuses, DE
Uwe Schussler · Aschaffenburg, DE
Tobias Stolley · Oberursel, DE

Key dates

Filing date	May 4, 2005
Grant date	Mar 20, 2012
Priority date	—
Expiry date	Jan 24, 2028

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2237/3325
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

This invention relates to a coater for the coating, in particular, of large-area substrates by means of cathode sputtering, the coater having a coating chamber and, provided therein, a cathode assembly (2) where the material to be sputtered is located on a target (4) with a curved surface, the material to be sputtered being located, in particular, on the lateral surface of a cylinder, there being in a single coating chamber for a coherent coating zone at least three, preferably more, cathode assemblies (2) with rotatable, curved targets (4) positioned one beside the other.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.