Organic graded spin on BARC compositions for high NA lithography
US8137874B2 · kind B2 · utility
4Cited by
3References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 23, 2008 |
| Grant date | Mar 20, 2012 |
| Priority date | — |
| Expiry date | Jan 6, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/091
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An antireflective coating that contains at least two polymer components and comprises chromophore moieties and transparent moieties is provided. The antireflective coating is useful for providing a single-layer composite graded antireflective coating formed beneath a photoresist layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.