Patent · US Active

Method and apparatus for overlay compensation between subsequently patterned layers on workpiece

US8137875B2 · kind B2 · utility

2Cited by

2References

11Claims

0Family size

Assignee

MICRONIC MYDATA AB · SE

Inventors

Fredrik Sjostrom · Täby, SE
Mikael Wahlsten · Stockholm, SE

Key dates

Filing date	May 22, 2009
Grant date	Mar 20, 2012
Priority date	—
Expiry date	Feb 23, 2030

Classification

Technology area (CPC G)Physics
CPC primaryG03F1/26
WIPO fieldOptics
WIPO sectorInstruments

Abstract

Methods and apparatuses for patterning workpieces are provided. The methods and apparatuses described herein improve overlay between subsequently patterned layers on a workpiece by introducing an improved alignment method that compensates for workpiece distortions.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.