Method to form nanopore array
US8138068B2 · kind B2 · utility
3Cited by
22References
20Claims
0Family size
Assignees
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Key dates
| Filing date | Aug 11, 2010 |
| Grant date | Mar 20, 2012 |
| Priority date | — |
| Expiry date | Sep 21, 2030 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81B2201/0214
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method of forming nanopore is provided that includes forming a first structure on a substrate, and forming a second structure overlying the first structure. An intersecting portion of the first and the second structures is etched to provide an opening of nanopore dimensions. The substrate may be etched with a backside substrate etch to expose the nanopore opening.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.