Image forming method and apparatus
US8144307B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Nov 4, 2008 |
| Grant date | Mar 27, 2012 |
| Priority date | — |
| Expiry date | Jul 25, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70466
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An array of phase-shifting micro-mechanical elements are used in a method and device for patterning a workpiece, for exposing a radiation sensitive layer on a workpiece such as a mask or a device substrate. The phase-shifting micro-mechanical elements are individually driven to modulate the electromagnetic radiation such that a high degree of control and precision in patterning is achieved. In some embodiments, the motion of the workpiece is synchronized with the relayed electromagnetic radiation that is modulated by the phase-shifting micro-mechanical elements in order to further control and increase precision in the patterning of the workpiece.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.