Contamination analysis unit and method thereof, and reticle cleaning system
US8146447B2 · kind B2 · utility
5Cited by
3References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 14, 2008 |
| Grant date | Apr 3, 2012 |
| Priority date | — |
| Expiry date | Jan 21, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2015/0687
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A contamination analysis unit and method for inspecting pollutants remaining on a target side of an inspection object such as a reticle after cleaning the object is provided. After steeping the target side in a solution, a sampling liquid may be abstracted therefrom after a predetermined time and may be analyzed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.