Patent · US Active

Arrangement for the illumination of a substrate with a plurality of individually shaped particle beams for high-resolution lithography of structure patterns

US8148702B2 · kind B2 · utility

7Cited by

21References

22Claims

0Family size

Assignee

VISTEC ELECTRON BEAM GMBH · DE

Inventors

Hans-Joachim Doering · Jena, DE
Thomas Elster · Jena, DE
Joachim Heinitz · Jena, DE
Matthias Slodowski · Jena, DE

Key dates

Filing date	Dec 10, 2009
Grant date	Apr 3, 2012
Priority date	—
Expiry date	Nov 5, 2030

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2237/0492
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

The invention is directed to an arrangement for the illumination of a substrate with a plurality of individually shaped, controllable particle beams, particularly for electron beam lithography in the semiconductor industry. It is the object of the invention to find a novel possibility for illuminating a substrate with a plurality of individually shaped, controllable particle beamlets which permits a high-resolution structuring of substrates with a high substrate throughput without limiting the flexibility of the applicable structure patterns or limiting the high substrate throughput due to a required flexibility.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.