Apparatus and method for repairing photo mask
US8153338B2 · kind B2 · utility
4Cited by
4References
10Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Jul 29, 2010 |
| Grant date | Apr 10, 2012 |
| Priority date | — |
| Expiry date | Jul 29, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/72
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An apparatus for repairing a photo mask, including a repairing atomic force microscope configured to repair a defective portion of the photo mask in a photo mask repair process, an electron microscope configured to navigate the repairing atomic electron microscope to the defective portion of the photo mask and to observe the photo mask repair process, and an imaging atomic microscope configured to image in-situ a shape of a repaired photo mask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.