Device and method for automatic detection of incorrect measurements by means of quality factors

US8154595B2 · kind B2 · utility

Assignee

• Vistec Semiconductor Systems Jena GmbH · DE

Inventors

• Hans-Artur Boesser · Breidenbach, DE
• Michael Heiden · Blieskastel, DE
• Klaus-Dieter Adam · Jena, DE

Key dates

• Filing date: Jan 31, 2008
• Grant date: Apr 10, 2012
• Expiry date: Feb 10, 2031

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01J2237/24592
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

What is disclosed is a device (1) for automatic detection of a possible incorrect measurement, wherein the device (1) comprises at least one reflected light illumination apparatus (14) and/or a transmitted light illumination apparatus (6) and at least one imaging optical system (9) and one detector (11) of a camera (10) for imaging structures (3) on a substrate (2), wherein a first program portion (17) is linked to the detector (11) of the camera (10), said detector being provided for determining the position and/or dimension of the structure (3) on the substrate (2), wherein the device (1) determines and records a plurality of measurement variables Mj, jε{1, . . . , L}, from which at least one variable G can be determined, wherein a second program portion (18) is linked to the detector (11) of the camera (10), said program portion calculating an analysis of the measurement variables Mj with regard to a possible incorrect measurement. Also disclosed is a method for automatic detection of a possible incorrect measurement wherein an analysis of the measurement variables Mj with regard to a possible incorrect measurement is calculated with a second program portion (18) which is linked…