Method and system for mask optimization
US8156450B2 · kind B2 · utility
1Cited by
8References
24Claims
0Family size
Assignee
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Key dates
| Filing date | Dec 18, 2006 |
| Grant date | Apr 10, 2012 |
| Priority date | — |
| Expiry date | May 20, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/36
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method and apparatus for mask optimization is provided. Mask design and production is optimized by providing proper weighting parameters for critical features. The parameters may include information such as parametric information, functional information, and hot spots determination.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.