Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive composition
US8158326B2 · kind B2 · utility
2Cited by
11References
30Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 13, 2008 |
| Grant date | Apr 17, 2012 |
| Priority date | — |
| Expiry date | Dec 26, 2028 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/123
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A compound which generates a sulfonic acid having one or more —SO3H groups and one or more —SO2— bonds upon irradiation with an actinic ray or a radiation; a photosensitive composition containing the compound; and a method of pattern formation with the photosensitive composition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.