Patent · US Active

Irradiation with high energy ions for surface structuring and treatment of surface proximal sections of optical elements

US8163632B2 · kind B2 · utility

0Cited by

8References

50Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Martin Weiser · Sinsheim, DE
Stefan Burkart · Rottenberg, DE
Holger Maltor · Aalen, DE

Key dates

Filing date	Dec 4, 2007
Grant date	Apr 24, 2012
Priority date	—
Expiry date	Nov 20, 2030

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2237/3151
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A method for processing the surface of a component, or the processing of an optical element through an ion beam, directed onto the surface to be processed, so that the surface is lowered and/or removed at least partially, wherein the ions have a kinetic energy of 100 keV or more, as well as optical elements processed by the method.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.