Optical element for radiation in the EUV and/or soft X-ray region and an optical system with at least one optical element

US8164077B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Marco Wedowski · Aalen, DE
• Markus Weiss · Aalen, DE
• Stephan Muellender · Aalen, DE
• Johann Trenkler · Trochtelfingen, DE
• Hartmut Enkisch · Aalen, DE
• Gisela Sipos · Oberkochen, DE
• Hubert Adriaan Van Mierlo · Maassluis, NL
• Michiel David Nijkerk · Amsterdam, NL
• Fokko Pieter Wieringa · Leuven, BE

Key dates

• Filing date: Nov 24, 2009
• Grant date: Apr 24, 2012
• Expiry date: May 5, 2030

Classification

• Technology area (CPC G): Physics
• CPC primary: G21K2201/067
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

An optical element, especially a normal-incidence collector mirror, for radiation in the EUV and/or soft X-ray region of wavelengths is described. The element has a substrate, a multilayer coating with an optically active region, and a capacitor, having a first and a second capacitor electrode. At least one layer of the multilayer coating serves as the first capacitor electrode. At least one dielectric layer is provided between the two capacitor electrodes. Also described is an optical system with at least one optical element, having a first electrode arranged in the vicinity of the optical element.