Photomask design verification
US8166423B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 8, 2009 |
| Grant date | Apr 24, 2012 |
| Priority date | — |
| Expiry date | Sep 28, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/36
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Solutions for verifying photomask designs are disclosed. In one embodiment, a method of verifying a photomask design includes: simulating an initial semiconductor manufacturing process using a plurality of mask shapes and variation models for the initial semiconductor manufacturing process, to generate a plurality of contours for the initial semiconductor manufacturing process; simulating a subsequent semiconductor manufacturing process using the contours for the initial semiconductor manufacturing process and variation models for the subsequent semiconductor manufacturing process, to generate a plurality of contours for the subsequent semiconductor manufacturing process; repeatedly simulating at least one further subsequent semiconductor manufacturing process using a plurality of contours for the subsequent semiconductor manufacturing process and variation models for the further subsequent semiconductor manufacturing process; and generating and storing a verification result for the photomask design on a computer readable storage medium.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.