Patent · US Active

Electrostatic chuck

US8169768B1 · kind B1 · utility

2Cited by
3References
12Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 21, 2009
Grant dateMay 1, 2012
Priority date
Expiry dateAug 17, 2030

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/6833
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

An electrostatic chuck for retaining a substrate. The chuck has a clamping surface for receiving the substrate, where the clamping surface is formed of a hard polymeric material filled with carbon nanotubes. Electrodes are disposed beneath the clamping surface, for inducing localized electrostatic charges in the substrate and thereby retaining the substrate against the clamping surface. A base supports the clamping surface and the electrodes.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.