Method for dimension conversion difference prediction, method for manufacturing photomask, method for manufacturing electronic component, and program for dimension conversion difference prediction
US8171434B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Sep 25, 2008 |
| Grant date | May 1, 2012 |
| Priority date | — |
| Expiry date | Sep 24, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F30/398
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method for dimension conversion difference prediction includes: determining an opening angle at a conversion difference prediction point on basis of a design pattern data; and predicting a dimension conversion difference on basis of correlation between the opening angle and an actual measurement value of the dimension conversion difference, or a method for dimension conversion difference prediction includes: determining an incident amount of incident objects at a conversion difference prediction point on basis of a design data; and predicting a dimension conversion difference on basis of correlation between the incident amount and an actual measurement value of the dimension conversion difference.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.