Katsumi Iyanagi
8Patents
2h-index
18Co-inventors
40Inventor score
Filing activity: Sep 21, 2007 → Mar 12, 2015
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9601370B2 | Nonvolatile semiconductor memory device and method of manufacturing the same | Electricity | 9 | Active |
| US8171434B2 | Method for dimension conversion difference prediction, method for manufacturing photomask, method for manufacturing electronic component, and program for dimension conversion difference prediction | Physics | 2 | Active |
| US9597922B2 | Method for liquid surface activation of transfer film, hydrographic method and hydrographic device implementing same | Performing Operations; Transporting | 0 | Active |
| US8196071B2 | Creating mask data of integrated circuit patterns using calculated etching conversion difference | Physics | 0 | Active |
| US9103025B2 | Magnetron sputtering apparatus and method of manufacturing semiconductor device | Electricity | 0 | Active |
| US8266552B2 | Pattern generating method, method of manufacturing semiconductor device, and recording medium | Physics | 0 | Active |
| US9111859B2 | Non-volatile memory device | Electricity | 0 | Active |
| US8276103B2 | Photomask designing method, photomask manufacturing method, and photomask designing program | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.