Method and apparatus for sub-pellicle defect reduction on photomasks
US8173331B2 · kind B2 · utility
0Cited by
5References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 11, 2010 |
| Grant date | May 8, 2012 |
| Priority date | — |
| Expiry date | Jun 26, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/48
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In one embodiment, the invention is a method and apparatus for sub-pellicle defect reduction on photomasks. One embodiment of a photomask for use in photolithography includes a substrate on which a pattern is formed, the substrate having a frontside and an opposite backside, and a protective coating formed on at least one of the frontside and the backside, the protective coating comprising silicon-based compound.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.