Illumination optical system for microlithography

US8174677B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Jens Ossmann · Aalen, DE
• Martin Endres · Oberkochen, DE
• Ralf Stuetzle · Aalen, DE

Key dates

• Filing date: Sep 19, 2008
• Grant date: May 8, 2012
• Expiry date: Mar 10, 2030

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70075
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

The disclosure provides an illumination optical system for microlithography that is designed so that, even with a change of illumination setting (e.g., a change in the given illumination conditions in the object field), variation of illumination parameters over the object field is confined within predetermined tolerances.