Ralf Stuetzle
12Patents
2h-index
16Co-inventors
43Inventor score
Filing activity: Jul 20, 2007 → Jan 6, 2015
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8587767B2 | Illumination optics for EUV microlithography and related system and apparatus | Physics | 5 | Active |
| US8174677B2 | Illumination optical system for microlithography | Physics | 3 | Active |
| US8937708B2 | Illumination optics for microlithography | Physics | 2 | Active |
| US8253925B2 | Catoptric illumination system for microlithography tool | Physics | 2 | Active |
| US7910900B2 | Collector for an illumination system | Physics | 2 | Active |
| US8179519B2 | Adjusting device with a laser light source and a reflector for aligning a microlithography projection exposure installation | Physics | 1 | Active |
| US9310692B2 | Component for setting a scan-integrated illumination energy in an object plane of a microlithography projection exposure apparatus | Physics | 1 | Active |
| US9110378B2 | Illumination optical system for projection lithography | Physics | 1 | Active |
| US9235137B2 | Illumination optical unit for microlithography | Physics | 1 | Active |
| US9304400B2 | Illumination system for EUV microlithography | Physics | 0 | Active |
| US9588434B2 | Catoptric illumination system for microlithography tool | Physics | 0 | Active |
| US9690203B2 | Method for adjusting an illumination setting | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.