Substrate handler, lithographic apparatus and device manufacturing method
US8174680B2 · kind B2 · utility
0Cited by
11References
21Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 30, 2009 |
| Grant date | May 8, 2012 |
| Priority date | — |
| Expiry date | Oct 5, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/7075
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An apparatus, method, and system is provided to condition a substrate. The apparatus can include a substrate handler, an array of diodes, and a projection system. The substrate handler can include a conditioning device, a float device, and a displacing device. The array of diodes can be configured to provide a patterned radiation beam, where the projection system projects the patterned radiation beam onto a target portion of a conditioned substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.