Use of design information and defect image information in defect classification
US8175373B2 · kind B2 · utility
13Cited by
3References
21Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 16, 2009 |
| Grant date | May 8, 2012 |
| Priority date | — |
| Expiry date | Oct 14, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06V2201/06
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
Defects observed by imaging tools may be classified by automatic comparison of features observed in a defect image with design information relating to corresponding portions of the image. Defect information may be generated from a defect image from a defect imaging tool. Design information relating to one or more structures to be formed on the substrate in a vicinity of the defect may be retrieved. The defect may be classified based on a combination of the defect information from the defect image and design information relating to one or more structures to be formed on the substrate in the vicinity of the defect.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.