Patent · US Active

Method of fabricating light-emitting apparatus with improved light extraction efficiency and light-emitting apparatus fabricated using the method

US8178424B2 · kind B2 · utility

3Cited by
6References
15Claims
0Family size

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Key dates

Filing dateNov 10, 2009
Grant dateMay 15, 2012
Priority date
Expiry dateNov 10, 2029

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10H20/01
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

Provided are a method of fabricating a light-emitting apparatus with improved light extraction efficiency and a light-emitting apparatus fabricated using the method. The method includes: preparing a monocrystalline substrate; forming an intermediate structure on the substrate, the intermediate structure comprising a light-emitting structure which comprises a first conductive pattern of a first conductivity type, a light-emitting pattern, and a second conductive pattern of a second conductivity type stacked sequentially, a first electrode which is electrically connected to the first conductive pattern, and a second electrode which is electrically connected to the second conductive pattern; forming a polycrystalline region, which extends in a horizontal direction, by irradiating a laser beam to the substrate in the horizontal direction such that the laser beam is focused on a beam-focusing point within the substrate; and cutting the substrate in the horizontal direction along the polycrystalline region.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.