Protective layer on objective lens for liquid immersion lithography applications
US8179516B2 · kind B2 · utility
0Cited by
18References
26Claims
0Family size
Assignee
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Key dates
| Filing date | Oct 11, 2006 |
| Grant date | May 15, 2012 |
| Priority date | — |
| Expiry date | Nov 13, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70341
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed is an objective lens adapted for use in liquid immersion photolithography and a method for making such a lens. In one example, the objective lens has multiple lens elements, one of which includes a transparent substrate and a layer of protective coating (PC). The PC is formed proximate to the transparent substrate and is positioned between a liquid used during the liquid immersion photolithography and the transparent substrate to protect the transparent substrate from the liquid.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.