Adjusting device with a laser light source and a reflector for aligning a microlithography projection exposure installation
US8179519B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Mar 12, 2008 |
| Grant date | May 15, 2012 |
| Priority date | — |
| Expiry date | Jan 7, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70141
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An adjusting device used to align two components of a microlithography projection exposure installation relative to each other. The adjusting device has an autocollimating device with a light source and a reflector. The light source and the reflector are each rigidly connected to one of the optical components. In one embodiment, the adjusting device has a laser light source which is different from the radiation source. A beam-splitter is downstream from the laser light source and carries useful adjustment light along a first optical path. A reflector can be rigidly connected to a reference component of an illuminating optics system or to a radiation source so that when an actual position of the reference component relative to the radiation source coincides with a desired position, the useful adjustment light is reflected back on itself. A bundle-sensitive component is sensitive to the direction and position of useful adjustment light in the optical path between bundle-sensitive component and reflector. The bundle-sensitive component can be rigidly mounted relative to the radiation source or the reflector. A light sensor is downstream from the beam-splitter in a second optical path …
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.