Apparatus and method for direct surface cleaning
US8182609B1 · kind B1 · utility
13Cited by
1References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 8, 2008 |
| Grant date | May 22, 2012 |
| Priority date | — |
| Expiry date | Jan 3, 2029 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention provides a method for cleaning a surface of a substrate that includes directing a laser towards at least one radiation-produced particle disposed on a substrate, generating a thermal increase in the particle and removing the particle from the substrate by thermal decomposition. The laser has a wavelength that substantially coincides with a high absorption coefficient of the particle.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.