Developable bottom antireflective coating compositions especially suitable for ion implant applications
US8182978B2 · kind B2 · utility
3Cited by
5References
21Claims
0Family size
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Key dates
| Filing date | Feb 2, 2009 |
| Grant date | May 22, 2012 |
| Priority date | — |
| Expiry date | Nov 23, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0397
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Compositions characterized by the presence of an aqueous base-soluble polymer having aromatic moieties and aliphatic alcohol moieties have been found which are especially useful as developable bottom antireflective coatings in 193 nm lithographic processes. The compositions enable improved lithographic processes which are especially useful in the context of subsequent ion implantation or other similar processes where avoidance of aggressive antireflective coating removal techniques is desired.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.