Semiconductor devices with improved local matching and end resistance of RX based resistors
US8183107B2 · kind B2 · utility
119Cited by
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Key dates
| Filing date | May 27, 2009 |
| Grant date | May 22, 2012 |
| Priority date | — |
| Expiry date | Apr 9, 2030 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D84/817
Abstract
Semiconductor devices are formed with reduced variability between close proximity resistors, improved end resistances, and reduced random dopant mismatch. Embodiments include ion implanting a dopant, such as B, at a relatively high dosage, e.g. about 4 to about 6 keV, and at a relatively low implant energy, e.g., about 1.5 to about 2E15/cm2.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.