Patent · US Active

Semiconductor devices with improved local matching and end resistance of RX based resistors

US8183107B2 · kind B2 · utility

119Cited by
10References
8Claims
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Key dates

Filing dateMay 27, 2009
Grant dateMay 22, 2012
Priority date
Expiry dateApr 9, 2030

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10D84/817

Abstract

Semiconductor devices are formed with reduced variability between close proximity resistors, improved end resistances, and reduced random dopant mismatch. Embodiments include ion implanting a dopant, such as B, at a relatively high dosage, e.g. about 4 to about 6 keV, and at a relatively low implant energy, e.g., about 1.5 to about 2E15/cm2.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.